

1. Custom‑engineered laser system; excellent dicing performance
2. Fully‑automatic production; ultra‑precision motion stage
3. High‑precision vision system with automatic alignment and auto‑focus search
4. Compatible with 4‑inch / 6‑inch wafers
5. SECS/GEM interface
Stealth‑dicing machine for SiC, GaN, LT and LN wafers
Machine Model | SiC Wafer Stealth Dicing Machine |
Wafer Size | 4inch/6inch Wafer |
Processing Speed | 400-1000mm/s |
Processing Accuracy | ±1μm |
Stage Parameters | Travel Range: 300mm×300mm |
Laser Parameters | Infrared |
Equipment Utilization | >98% |
Mean Time Between Critical Failures (MTBCF) | >1000H |
Yield | ≥99.5% |